CosRx Hyaluronic Acid Intensive Cream

1,900.00

In stock

In stock

Best Before Date: 10 Mar 2025

Intensely hydrating cream boosts moisture content in your skin and seals it inside, protecting your skin from further loss of hydration. Highly concentrated with hippophae rhamnoides water and hyaluronic acid, COSRX Hyaluronic Acid Intensive Cream is a nourishing moisturizer perfect for dry/dehydrated skin as hyaluronic acid holds onto moisture and keeps the skin hydrated.

  • Without feeling oily or heavy, this intensively hydrating cream makes the skin feel soft like clouds and provides long-lasting moisture. 
  •  Helps reduce the appearance of fine wrinkles by boosting the skin with moisture. 
  • The skin will look much plumper, smoother, and give a beautiful glow.

Suitable for: All skin types; Recommended for Dry/ Dehydrated skin to boost the skin with moisture.

pH: 6.00~7.00

 

Skinroute is the authorized importer and reseller of CosRx in India
Weight 1.8 kg
Dimensions 5 × 8 × 5 cm
Skin Concern

Anti-aging, Brightening, Fine lines and Wrinkles, Hydrating, Strengthening Skin Barrier

Skin Type

Acne Prone, Combination, Dry/Dehydrated, Normal, Oily, Sensitive

Item Weight

100 g

Brand

CosRx

How to use

Skincare Step: Moisturizer

  • After cleansing and toning, gently apply a proper amount of the cream to the face, avoiding the eye and mouth area.
  • Tap the area where the cream was applied gently in order for it to be absorbed along the skin texture.

Ingredients

Key Ingredients:

  • Hyaluronic Acid – Deeply moisturizes the skin

Other Ingredients:

Hippophae Rhamnoides Water, Glycerin, Butylene Glycol, Caprylic/Capric Triglyceride, Betaine, Helianthus Annuus (Sunflower) Seed Oil, Cetearyl Alcohol, Cetearyl Olivate, Sorbitan Olivate, Macadamia Ternifolia Seed Oil, 1,2-Hexanediol, Sodium Hyaluronate, Arginine, Panthenol, Dimethicone, Ethylhexylglycerin, Carbomer, Allantoin, Xanthan Gum.

Reviews

Be the first to review “CosRx Hyaluronic Acid Intensive Cream”

Your email address will not be published. Required fields are marked *